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- A special coating system wsa newly developed for metallic film resistors deposited through magnetron sputtering process, which was available to provide low, medium and high-resistance films. 摘要新型磁控溅射电阻镀膜机是在同一台设备上能制作出中、低和高阻值金属膜电阻的专用设备。
- direct current magnetron sputtering process 直流磁控溅射法
- Effect of Magnetron Sputtering Process on Forming of Ti Thin Film 磁控溅射工艺对纳米Ti膜形貌的影响
- Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process 射频等离子体增强非平衡磁控溅射沉积技术
- magnetron sputtering process 磁控溅射
- The source material for a sputtering process. 溅射工艺用源材料。
- The Nb/Al-AlOx/Nb all-niobium tunnel junctions were fabricated by dc magnetron sputtering, with selective niobium etching process and selective niobium anodiza-tion process. 用磁控溅射方法及选择铌阳极氧化和选择铌刻蚀工艺制备了Nb/Al-AlO_x/Nb全铌隧道结,给出了工艺要点。
- Equipped with varied kinds of Magnetron Sputtering coaters of vertical, in-line, reel-to-reel, and cylindric types, we are engaged in thin-film growing process. 本公司多年从事磁控溅射加工,拥有立式、卧式、卷绕、圆柱各式磁控溅射机器。
- The work contains the following aspects: 1.Describe the process of the fabrication of titanium dioxide thin film using a magnetron sputtering and pulsed laser deposition. 内容和结论主要包括:1.;采用磁控溅射和脉冲激光沉积方法制备二氧化钛薄膜的过程。
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- The results of EPMA showed that the metallicfllms deposited on the metallic substates by the magnetron sputtering ion plating process are the mixed filmswhich consist of the elements of the target and the substrate. 电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
- Pb(Zr0.52Ti0.48)O3 (PZT) and (Ba0.7Sr0.3)TiO3 (BST) ferroelectric thin films with distinct perovskite microstructure were prepared by RF magnetron sputtering method ,following a rapid thermal annealing (RTA) process. 应用射频磁控溅射方法;利用快速热退火(RTA)工艺;分别制备出了具有良好铁电性能的 Pb(Zr0.;52Ti0
- Its approach is to deposit the CIGS layer using a sputtering process borrowed from the disk-storage industry. 它的方法是通过借鉴于碟片储存行业的“喷溅”处理来沉积CIGS层面。
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel. 用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。
- A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。
- Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering. 采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜。