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- Focused Ion Beam Lithography Technology 聚焦离子束曝光技术
- Keywords highly oriented pyrolytic graphite;focused ion beam etching;electron beam lithography;reactive ion etching; 高定向热解石墨;聚焦离子束刻蚀;电子束曝光;反应离子刻蚀;
- ion beam lithography 离子束刻蚀法
- focused ion beam lithography 聚焦离子束光刻
- We used Ebeam lithography to define the photonic crystal patterns and ion beam etcher for the etching process. 元件制作方面，我们使用电子束微影系统来定义光子晶体的图形，并用离子束蚀刻机进行蚀刻制程。
- It is a technique called ion beam writing. 这一技术被称为离子束刻写。
- Ion beam mutation has significant bio-effect. 摘要离子诱变具有显著的生物学效应。
- The 6 achievements on Ion Beam Bio-engineering of Low Energy were outlined. 摘要简述了低能离子束生物技术在6个主要方面的研究成果。
- ITRI MIRL has a high resolution electron beam lithography (EBL)system, which has the ability to exposure the nano-scale patterns. 工研院机械所拥有之电子束直写机为具有高解析度微影系统，可用以曝写奈米尺寸之图形。
- Ion beam induced surface modification of polymer was extensively discussed. 介绍了运用高能离子束对聚合物材料进行表面改性的新工艺。
- The composition,principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced. 本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；
- The Ee-BES-40A electron beam lithography system manufactured by the Varian Co. in U.S.and imported by IEE of Academia Sinica is a second-hand machine. 本Be－BES－40A电子束曝光机是电工所引进美国Varian公司的二手设备。
- Allison scanner for high-current ion beam emittance measurements[J]. 引用该论文 徐蓉;邹宇斌;高淑丽;郭之虞;彭士香;钱锋;赵捷.
- Antireflective film prepared by periodic ion beam assisted deposition[J]. 引用该论文 张大伟;黄元申;贺洪波;邵建达;范正修.
- Some progress on top-down nano-fabrication, such as electron beam lithography,X-ray lithography and EUV lithography were introduced. 介绍了电子束曝光技术、EUV光刻技术和X射线光刻技术的进展;
- During the layerout cutting process for the e beam lithography system, some polygons with one or more inner holes may appear. 电子束曝光机版图切割过程中可能出现带内孔的多边形,并且多边形内环与外环之间可能发生重叠。
- Electron beam lithography lays down circuit patterns more slowly than photolithography does, because it generates patterns serially instead of in parallel. 电子束微影制程布设电路图样时，比光刻技术慢，因为它是以循序而非平行方式产生图样。
- Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. 以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
- In addition, average angular information is taken from adjacent segments and the incident ion beam. 另外，可以从邻近线段和入射离子束取得平均角度的信息。
- The system of ion beam implantation had been established and the biological effects were primarily studied. 壮观链霉菌1043为一壮观霉素生产菌种，通过实验建立了离子注入选育壮观链霉菌。
