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- ion vapor deposition 离子蒸发沉淀
- Ultra-High Vacuum Physical Vapor Deposition. 超高真空物理汽相沉积。
- Phosphine(PH3)is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping,ion implement and chemical vapor deposition(CVD) etc. 磷化氢(PH3)是一种重要的电子特气,主要用于n型半导体的掺杂、离子注入和化学气相沉积(CVD)等。
- In vapor deposition,RE elements can increase the bo... 结果表明,稀土元素的加入均能显著提高模具的使用寿命。
- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- The fabrication technology of single-element-semiconductor quantum dots is introduced in this paper, including RF magnetron sputtering, Si ion implantation, chemical vapor deposition, sol-gel method. 介绍了单元素半导体量子点的制备方法，包括射频磁控溅射技术、硅离子注入技术、化学气相沉积法、溶胶-凝胶法等；
- In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- In this paper,prevailing TBC deposition technologies,including plasma spray,electron beam-physical vapor deposition,ion beam assisted film deposition and chemical vapor deposition,are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术,包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。
- Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition. 工具用的复晶钻石涂层，则是使用化学气相沉积法制造的。
- Carbon nanotubes(CNTs)were prepared from acetylene at 923 K with Ni as catalysts by chemical vapor deposition(CVD). 以乙炔为原料气,采用Ni粉为催化剂,在923K下,由化学气相沉积法(CVD)制得了碳纳米管。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多，包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition，CVD)等。
- The effective channel for improved die life is chemical vapor deposition (CVD) coatings of Ti (C, N) and TiN. 化学气相沉积(CVD)涂层TiN、Ti(C,N)是提高模具使用寿命的有效途径。
- UHMWPE fibers were treated by chromic acid oxidation and pyrrole vapor deposition respectively. 摘要采用铬酸氧化法及吡咯气相沉积聚合法处理UHMWPE纤维。
- Stacked Ge quantum dots are grown on Si(100) by u ltra-high vacuum chemical vapor deposition(UHV/CVD). 用超高真空化学气相淀积系统在Si(1 0 0 )衬底上生长了多层Ge量子点 .
- The paper focuses on vacuum vapor deposition for making parylene film which is used in many targets. 介绍了真空气相沉积法制备聚对二甲苯薄膜的实验设备、实验原理和实验方法。
- The chemical vapor deposition of dia mond films on copper substrates with Ti -Al -Mo intermediate layer was studied. 实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力。
