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- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Nickel oxide thin films were deposited by de reactive magnetron spu tring. 用直流反应磁控溅射法制备了氧化镍电致变色薄膜，采用XRD和TEM对所制的薄膜结构进行了研究。
- The ZrN films were deposited by RF magnetron reactive sputtering system. 使用反应性磁控溅镀系统成长氮化锆薄膜。
- You must help magnetron arrange a series of metal balls in a specific pattern. 你必须帮助磁控管安排了一系列的金属球在一个特定的模式。
- Magnetron is often used as microwave power source in clinical linac magnetron. 在医用直线加速器中通常都采用磁控管作为微波功率源。
- Prepulse effects on the characteristics of relativistic magnetron[J]. 引用该论文 李天明;李家胤;于秀云;马文多;葛鹏.
- The FM system is used for changing the oscillating frequency of the magnetron. 调频机构用来改变磁控管的振荡频率。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- The noise is from the fan that blows air across the magnetron to keep it cool. 这个噪音是空气从散热风扇吹出经过磁控管所产生的声音。
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
- Magnetron it is characterized by small weight and a low level of the SHF radiation from a cathodic leg. 其特点在于小的重量和低的阴极超高频辐射。
- They paid specialattention to raising the quality of magnetron and multicavity klystron. 他们特别注意提高磁控管和多腔速调管的质量。
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- Magnetron has filamentary cathode with small time hearting, the shielded cathodic site, liquid cooling and the filter built - in by radio. 它具有加热时间短的细丝阴极，液体冷却和内建无线电滤波。
- TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel. 用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。
- A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。
- Iron-nickel oxide films were deposited by DC reactively magnetron sputtered apparatus with two face-to-face targets. 采用对靶直流磁控溅射制备的铁镍氧化物薄膜,其电特性、电化学特性和结构与反应溅射过程中氧氩比之间有很大的关系。
- Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering. 采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜。
- They paid special attention to raising the quality of magnetron and multicavity klystron. 他们特别注意提高磁控管和多腔速调管的质量。
