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- glow ion plating film 辉光离子镀膜
- Application of MCGS in the Control System of Electric Arc ion Plating Film Device MCGS组态软件在电弧离子镀膜设备控制系统中的应用
- Abstract Plasmas in Multi-Arc Ion Plating(MAIP) are made up of glow and arc plasma. 多弧离子镀中的等离子体是由辉光等离体和弧光等离子体迭加而成的。
- ion plating film 电离镀膜
- electric Arc ion plating film 电弧离子镀膜
- NiCrAlY coating was deposited on Ti6Al4V substrate by arc ion plating (AIP). 采用电弧离子镀(AIP)技术在Ti6Al4V基体表面沉积制备了NiCrAlY涂层。
- NiCrAlY coatings were deposited on superalloy IC-6 by arc ion plating (AIP). 采用电弧离子镀技术在IC-6高温合金上沉积NiCrAlY涂层.
- By remaking now available glow ion nitrogen furnace and technological test,the range of ion nitrogen is enlarged,the questions of oxide and being out of shape are solved. 通过改造现有辉光离子氮化炉及工艺试验，扩大离子氮化的氮化范围，解决离子氮化后的氧化及变形问题。
- It is proved that the glow ion nitriding furnace can be em-ployed in ion aluminizing.The conclusion is attained that one furnace can be used inseveral ways and ... 结果得出了完全可以利用辉光离子氮化炉进行离子渗铝,实现一炉多作用离子轰击大大加速渗铝过程的重要结论。
- By remaking now available glow ion nitrogen furnace and technological test, the range of ion nitrogen is enlarged, the questions of oxide and being out of shape are solved. 通过改造现有辉光离子氮化炉及工艺试验,扩大离子氮化的氮化范围,解决离子氮化后的氧化及变形问题。
- The structure and composition of (Ti, Al)N film deposited by multi-arc ion plating on W6Mo5Cr4V2 is analyzed by Scanning Electron Microscopy(SEM),X-ray diffraction (XRD) and Energy Dispersesd Spectroscopy (EDS). 运用多弧离子镀在W6Mo5Cr4V2 高速钢表面沉积了（Ti，Al）N 镀层，并经SEM、XRD 和EDS等方法分析表明，多靶联合工作获得的（Ti，Al）N 镀层，其成分可连续变化，随弧流增大，铝含量增多；
- Cathodic arc ion plating (CAIP) has been widely applied in modern technology field. 多弧离子镀在现代科技领域中有着广泛的应用。
- KEYWORDS : GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source. 多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
- KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating ， medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- The question of "dimple" during the process of HCD ion plating deposition was discussed. 有负偏压时沉积的薄膜比无负偏压时沉积的薄膜具有更好的机械性质。
- P.D dept difinitize plating film technic requirment on 03 headrest staff blueprint.Headrest framework supplier will plate film strict according to the requirement. 开发部在03款头枕杆图纸上明确电镀膜厚技术要求，头枕骨架供应商严格按此要求镀膜。
- Technological Test for Glow Ion Nitrogen 辉光离子氮化工艺试验
- The advantages of ion imitating gold electroplating , process sorts and properties of common imitating ion plating deposits were summarized. 对离子仿金电镀工艺的优点、常用仿金离子镀镀层的种类和性能进行了概括。
- the glow ion nitriding technique 辉光离子氮化
