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- An apparatus and process for atomic layer deposition that minimizes mixing of the chemicals and reactive gases is disclosed. 在本发明中提供了一种用于原子层沉积的装置和方法,该装置和方法能减小化学用品和反应气体的混合。
- Theory and Applications of Atomic Layer Deposition 单原子层沉积原理及其应用
- Development in Atomic Layer Deposition and Its Applications 原子层沉积技术及应用发展概况
- Atomic layer deposition and its applications in semiconductor 原子层沉积技术及其在半导体中的应用
- Principle and Application of Ferroelectric Films by Atomic Layer Deposition 原子层沉积技术及其在铁电薄膜制备中的应用
- Keywords Atomic layer deposition(ALD);Low-pressure chemical vapor deposition(LPCVD);Holographic lithography(HL);Direct laser writing (DLW); 原子层沉积;化学气相沉积;激光全息光刻;激光直写技术;
- Atomic layer deposition 原子层沉积
- In this thesis, the alternative high-k dielectrics made by atomic layer chemical vapor deposition are used to instead of silicon dioxide. 本论文中,就是以原子层化学汽相沉积的高介电系数的材料来取代二氧化矽。
- The diffusion coefficient of RaA atoms,being 0.071cm~2/s,was determinedusing two-filter wall deposition method. 采用壁沉积方法;测得 RaA 的扩散系数 D=0.;071cm~2/s。
- TiO2 films were prepared by sol-gel and print screen method, MgO/TiO2 films were prepared by liquid deposition method. 用sol-gel法和丝网印刷法制备多孔TiO2薄膜,溶液沉积法制备MgO/TiO2复合薄膜。
- The ATOMIC layer, highlighted in yellow, enables the development of a unified grid infrastructure. ATOMIC层以黄色表示,它可以用来开发统一的网格基础设施。
- The pearly pigment of mica titanium was prepared by using the liquid deposition method with the urea as precipitant. 采用尿素作为中和剂,用液相沉积法制备了云母钛珠光颜料。
- This resulted in a rough and bead-shaped surface, obstructing a smooth layer deposition. 球化的出现妨碍了直接金属激光烧结成形的顺利进行。
- A template-free electrochemical deposition method for preparations of ZnO nanorod array is reported. 摘要报道了一种氧化锌纳米线阵列的无模板电沉积制备方法。
- Abstract: C-N films were synthesized on high-resistance Si(111) substrates by cluster beam deposition method. 利用荷能团簇沉积装置在高阻硅(111)衬底上沉积了碳氮薄膜。
- The uniaxial tensile deformation and shear deformation of nano bicrystal copper within (111) atomic layer are studied with molecular dynamics. 模拟结果显示纳米铜双晶的拉伸与剪切变形都是由弹性变形与塑性变形两个阶段构成。
- Atomic Layer Deposition. International Conference. 6Th 2006. (2 Cd-Roms) Ald 2006 (Presentations And Posters)/ Held 24-26 July 2006, Seoul, Korea. 2006年第6届国际原子层沉积会议会议录(2光盘)(演示和海报)
- BaTiO_3/SrTiO_3 (BTO/STO) multilayer films have been fabricated on Pt/Ti/SiO_2/Si substrates by a pulsed laser deposition method. 采用脉冲激光沉积法在Pt/Ti/SiO2/Si衬底上制备了BaTiO3/SrTiO3(BTO/STO)多层膜。
- The plating used an economical copper replacement deposition method that differs from general electrodeless-plating pretreatment. 利用简单、低成本的置换沉积铜法新工艺,进行表面金属化处理。
- The mechanical behavior of nano-single crystal and nano-bicrystal copper within (111) atomic layer under static tensile loading is studied with molecular dynamics. 用分子动力学方法模拟了纳尺度铜单晶与铜双晶的(111)面原子的静拉伸力学行为。