Advance in reactive magnetron sputtering的用法和样例：
- In this article, we systemically discuss the effect of deposition parameters on prepared VO2 films of reactive magnetron sputtering.
- At present, they have various deposition methods for prepared VO2 films and reactive magnetron sputtering method is relatively perfect.
- In this paper, CIO thin film was prepared by DC reactive magnetron sputtering method in JGP450 type high vacuum magnetron sputtering apparatus, the surface morphology and structure of the CIO thin film were analyzed by AFM, XRD and XPS.
- TiO 2 thin films with the thickness of 300nm were deposited,at a total pressure of 0.80Pa in mixed O 2 and Ar atmosphere(O 2 /Ar :0.10,0.20,0.30),on SiO 2 -coated glass substrates by DC reactive magnetron sputtering.