XRD,XPS,and AFM reveal that the hardest Ti-Si-N film consists of fine TiN crystallites(approximately 8 nm in size) surrounded by amorphous Si_3N_4.The preferential growth of TiN is indicated in the XRD patterns.

• XRD和XPS结果显示；最硬的Ti-Si-N膜层包含大小约为8 nm的TiN纳米晶以及包围在其周围的非晶态Si3N4.；XRD结果显示；随着Si的引入；膜层中TiN晶粒的择优取向由纯TiN膜层中的(111)变为Ti-Si-N膜层中的(200)