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- In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术,包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- In this paper,prevailing TBC deposition technologies,including plasma spray,electron beam-physical vapor deposition,ion beam assisted film deposition and chemical vapor deposition,are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术,包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- Ti coated superhard abrasive (diamond and CBN) micro-powder can be produced industrially by vacuum slow vapor deposition technology. 本文报道了采用真空微蒸发镀覆技术进行工业化超硬材料微粉镀覆生产。
- Vapor deposition technologies 气相沉积技术
- Ultra-High Vacuum Physical Vapor Deposition. 超高真空物理汽相沉积。
- Development and Application of Electron Beam Physical Vapor Deposition Technology 电子束物理气相沉积技术的发展和应用
- In vapor deposition,RE elements can increase the bo... 结果表明,稀土元素的加入均能显著提高模具的使用寿命。
- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- This paper introduced the preparation technologies and properties of CVD for Si_3N_4 films and the process of low pressure chemical vapor deposition(LPCVD). 简要介绍了Si3N4膜的制备方法及CVD法制备的Si3N4薄膜的特性;详细介绍了低压化学气相淀积(LPCVD)氮化硅的工艺.
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Lida Vacuum Deposition Technology Co., Ltd. 利达真空镀膜技术有限公司。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- Therefore, some membrane-forming technologies have been developed to prepare the electrolyte membranes, for example, electrochemical vapor deposition (EVD), plasma spraying, sol-gel etc. 如电化学气相沉积法、等离子喷涂法、溶胶-凝胶法等。
- Finally the vacuum evaporating deposition technology and the method of making thin film highly sensitive to ethonal vapor has been studied. 具体研究了真空蒸发技术制备高灵敏度的乙醇气体敏感膜的方法,最后成功研制出微型乙醇气体传感器。
- The status and development trend of surface treatments,such as nitriding,vapor deposition,plasma modification and multiplex surface treatment technolog y used for cutting tools were described. 介绍了渗氮、超低温处理、气相沉积、等离子改性以及复合表面处理技术等在切削刀具中的应用现状和发展趋势。
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。
- Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition. 工具用的复晶钻石涂层,则是使用化学气相沉积法制造的。
- Carbon nanotubes(CNTs)were prepared from acetylene at 923 K with Ni as catalysts by chemical vapor deposition(CVD). 以乙炔为原料气,采用Ni粉为催化剂,在923K下,由化学气相沉积法(CVD)制得了碳纳米管。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多,包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition,CVD)等。