The results showed that the formation of TiO2 porous films by anodization was controlled by voltage, barrier thickness when one-step voltage method or continuous voltage method was applied.

• 研究结果表明，采用一步施加电压和连续施加电压的方法，氧化钛薄膜纳米孔的形成过程由电压、阻挡层的厚度决定；