The results indicate that all the chelating agents of PAA,HEDP and AMPS can obviously reduce Cu deposition on silicon wafer surface,and the ability to reduce Cu deposition by 83%,79%,44% respectively.是什么意思_The results indicate that all the chelating agents of PAA,HEDP and AMPS can obviously reduce Cu deposition on silicon wafer surface,and the ability to reduce Cu deposition by 83%,79%,44% respectively.在线翻译_英语_读音_用法_例句