The growth technique of SiO_2+PSG+SiO_2 three-layer film is investigated and analysed. On the basis of experiments, the typical parameters and characteristics of the present CVD system are discussed with thermodynamic theory.

• 分析了SiO_2+PSG+SiO_2三层钝化增透膜的生长工艺,对实验结果进行了热力学理论探讨;