The first part is the study of utilizing hexamethyldisiloxane (HMDSO) film as the bottom antireflective coating (BARC) layer for deep ultraviolet (DUV) and vacuum ultraviolet (VUV) lithographies.

• 第一部分是利用六甲基矽氧烷(HMDSO)薄膜作为深紫外光及真空紫外光微影术的光阻底部抗反射层(BARC)。