The GOI surface roughness is reduced by thermal rapid annealing with hydrogen gas in furnace, and hydrogen annealing is obvious and promising to reduce SOI and GOI surface roughness.

 
  • 利用炉管高温下进行氢气热退火使绝缘层上锗的表面粗糙度减少,由实验结果看来氢气热退火有显著且有效的降低绝缘层上锗、矽的表面粗糙度。
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