Si/Ti atomic ratio of the deposited thin films was mensurated by ICP-AES. TiO2/SiO2 thin films were characterised by XRD, FTIR and BET methods. Photocatalytic activity of TiO2/SiO2 thin films was evaluated by degradation of methylene blue as a probe.

• 用ICP-AES测定TiO_2/SiO_2复合薄膜中Si/Ti原子比,用BET法测定了薄膜上粉体的比表面积,用XRD、FTIR三点全反射光谱法等对TiO_2/SiO_2复合薄膜进行了表征,并用亚甲蓝的降解,评价了TiO_2/SiO_2复合薄膜的光催化活性。