Si Quantum dots(Ti doped) have been formed by self-assembled growth on SiO_2 surfaces using the low pressure chemical vapor deposition(LPCVD) with two step annealing.

 
  • 通过自组装生长并结合两步退火处理,在SiO2表面得到了Ti掺杂的Si纳米晶粒量子点。
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