Secondly, sputtering YIG on the Al2O3 substrate with RF-sputtering instrument and analyzing the film with AFM, the average grain size is 100nm and the surface roughness is about 10nm.

• 然后,用射频溅射法在氧化铝基片上溅射YIG 薄膜,并用原子力显微镜探测薄膜表面形貌,平均晶粒尺寸为100nm,表面粗糙度约为10nm,薄膜质量较好,为移相器的制作提供了介质薄膜基础;