On the other hand, nanoimprint lithography can fabricate nanomete structure which is smaller than 70nm conveniently, as well as inheriting parallelity of conventional photo-lithography.

• 它既继承了传统光刻技术所具有的并行性,又同时拥有传统光刻技术不易达到的纳米结构制备能力,这为今后纳米结构的广泛应用提供了良好的条件。