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- Experiments were made by different methods of microwave plasma processing on curing time,application period,bonding strength and free formaldehyde content of UF resin. 试验结果表明:等离子处理对脲醛树脂胶粘剂的固化时间和适用期的影响不明显;
- Microwave plasma processing 微波等离子处理
- The Plasma Batch System 300 is a compact Microwave Plasma Batch System for resist ashing and wafer cleaning in semiconductor applications. 微波等离子体300是一个简洁的微波等离子，主要应用于半导体方面的灰烬消除和晶片清洁。
- CN x films were deposited on the Si(100) substrates with microwave plasma CVD method. 沉积在Si（100）基片上的CNx膜是用微波等离子体化学气相沉积法（MWPCVD）制备的。
- Due to the use of microwaves the plasma systems 400 and 660 provide for fast and damage-free plasma processing. 由于微波技术的应用,等离子体400和660系列可提供快速与无损害的等离子处理。
- The diamond films doped with boron were synthesized on the Si 3N 4 substrate by microwave plasma CVD method (MPCVD). 采用微波等离子体化学气相沉积 ( MPCVD)的方法在 Si3N4 基片上制作了掺硼金刚石薄膜。
- Determination of alkali earth metal by microwave plasma torch atomic emission spectrometry (MPT AES) was investigated. 用微波等离子体炬原子发射光谱法（MPT－AES）测定了一些碱土金属元素。
- Formation of polymeric deposit was investigated in methane conversion by microwave plasma. 摘要考察了微波等离子体甲烷转化反应中积炭的形成条件。
- A method and system for controlling electron densities in a plasma processing system (105). 一种用于控制等离子体处理系统中电子密度的系统(105)。
- Plasma systems 400 and 660 are low-pressure microwave plasma systems for cleaning advanced chip packages prior to die attach, wire bond and encapsulation. 等离子体400和660系列是低压微波等离子体应用于提高模具粘合，引线的焊接，特别是清洗高级的芯片封装。
- Users can create, modify, monitor and troubleshoot plasma process from the front panel. 用户可以创造、更改、监控等离子体处理过程甚至可以利用前面的仪表盘充当故障检修员.
- This paper presents a new method of reduction of sintering low concentration fume absorbed with solid waste by microwave plasma. 提出了一种微波-固体废弃物吸附法降低烧结低浓度有害废气的新方法。
- Nunogaki M, Transformation of titanium surface to TiC-or TiN-ceramics by reactive plasma processing [J]. Materials and Design, 2001, 22: 601-604. 徐重.;双层辉光等离子体渗金属发展现状和展望[J]
- Watanabe I,Sugata K.Diamond films synthesized by microwave plasma CVD of ethylalcohol[J].Jpn J Appl Phys,1988,27(8):1397. 丁发柱;石玉龙.;直流等离子体-热丝化学气相沉积金刚石薄膜的研究[J]
- Microwave plasma torch atomic emission spectrometry(MPT-AES) was used to determine the content of calcium and zinc in kelp after being digested. 分别使用常规消解方法与微波消解方法处理海带样品,采用微波等离子体炬原子发射光谱法(MPT-AES)测定海带中钙和锌的含量。
- The purpose of this web site is to provide a complete, yet concise, set of reliable electron collision data for gases used in the plasma processing of semiconductor devices. 半导体设备等离子处理所用气体的电子碰撞数据。
- The method for improving surface wettability of styrene butadiene rubber using microwave plasma is provided in this paper. 介绍了一种用微波等离子体处理消声瓦橡胶以提高表面湿润性的方法,并用蒸馏水和醇对接触角进行测定。
- The results reflect that treated by low temperature plasma processing the surface squama of yak hair was etched and the effect of air plasma was better than that of oxygen plasma. 研究结果表明，低温等离子体表面改性处理能够刻蚀牦牛毛纤维表面的鳞片，而且空气等离子体的刻蚀效果优于氧等离子体的刻蚀效果；
- Under the catalytic effect of nickel particles, spring-like carbon filaments were synthesized through microwave plasma chemical vapor deposition. 以镍为催化剂,利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
- Based on the drift diffusion equations as an example of a continuum model and particle in cell/Monte Carlo collision kinetic model,a plasma processing model is proposed. 在漂流 扩散方程的连续流模型和单元粒子 蒙特卡罗碰撞动力学模型的基础上 ,提出了一个等离子体工艺模型。
