您要查找的是不是:
- The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. 摘要利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了矽膜。
- The non-stoichiometry semi-conductive indium oxide films were prepared on glass surface using magnetron-sputtering deposition synchro-enhanced by microwave ECR plasma soure ion-implantation. 利用微波电子自旋共振等离子源离子注入增强沉积法在玻璃表面制备了非化学计量半导体氧化铟膜。
- Study of Microwave ECR Plasma Propagating Property 微波ECR等离子体的传播特性研究
- Calculation of Electron Power Absorption in Microwave ECR Plasma 微波ECR等离子体中的电子能量吸收的计算
- INVESTIGATION OF MATERIALS PROCESSED WITH THE MICROWAVE ECR PLASMA 微波ECR等离子体材料加工技术研究
- THE TECHNOLOGY AND APPLICATIONS OF MICROWAVE ECR PLASMA 微波电子回旋共振等离子体技术及其应用
- MICROWAVE ECR PLASMA SOURCE ION IMPLANTATION ON ALUMINUM ALLOY 微波ECR等离子体中铝合金的全方位氮离子注入
- Microwave ECR Plasma Parameter Measurement and Analysis 微波ECR等离子体参数测量及分析
- Microwave ECR plasma diagnosis in aPSII system with Langmuir probe PSII系统中微波ECR等离子体的朗缪尔探针诊断
- Twinned microwave ECR plasma source enhanced magnetron sputtering 双放电腔微波-ECR等离子体源增强磁控溅射沉积技术
- Study of TiN Thin Film by Microwave ECR Plasma Reaction Sputtering Deposition 微波ECR等离子体溅射沉积TiN薄膜的研究
- Study of ionization properties of microwave ECR plasma by emission spectroscopy 用发射光谱方法研究微波ECR等离子体电离特性
- Keywords Aluminum alloy;Microwave ECR plasma;Nitrogen PSII;Surface hardness; 铝合金;微波ECR等离子体;全方位氮离子注入;表面硬度;
- Preparation and characterization of DLC films by microwave ECR plasma source enhanced unbalance magnetron sputtering 微波ECR等离子体源增强非平衡磁控溅射DLC膜的制备与表征
- Preparation of Silicon Thin Films on Glass Surface Using Microwave ECR Plasma Source Enhanced Magnetron Sputtering 用微波ECR等离子体增强磁控溅射沉积法在玻璃上镀膜
- THE STRUCTURAL STUDY OF TI FILMS DEPOSITED BY MICROWAVE ECR PLASMA SPUTTERING METHOD 微波ECR等离子体溅射沉积T_t薄膜的结构研究
- Development of a New Apparatus on Magnetron Sputtering Deposition Assisted by Microwave ECR Plasma 微波ECR等离子体辅助磁控溅射沉积装置的研制
- A New Multifunctional Equipment for Microwave ECR Plasma Applications and Diagnosis 多功能微波等离子体应用基础研究设备
- Preparation of Indium Oxide Film on Glass Surface Using Sputtering Deposition Synchro-enchanced by Microwave ECR Plasma Source lon-implantation 用微波电子自旋共振等离子源离子注入增强溅射沉积法在玻璃表面制备氧化铟膜
- Deposition of High Quality GaN Film Under High ECR Plasma Density ? 在高ECR 等离子体密度下沉积高质量氮化镓薄膜(英文)