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- inductively-coupled microwave plasma source (ICP) 电感耦合微波等离子体源（ICP）
- low power inductively-coupled microwave plasma source 小功率电感耦合微波等离子体源
- The Microwave Plasma Source Used in Large Area Material Modification 用于大面积材料表面改性研究的微波等离子体源
- Microwave plasma source 微波等离子体源
- The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. 摘要利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了矽膜。
- The key to the technology is the gridless plasma source(GIS). 该技术核心是无栅等离子体源(GIS)。
- The Plasma Batch System 300 is a compact Microwave Plasma Batch System for resist ashing and wafer cleaning in semiconductor applications. 微波等离子体300是一个简洁的微波等离子，主要应用于半导体方面的灰烬消除和晶片清洁。
- CN x films were deposited on the Si(100) substrates with microwave plasma CVD method. 沉积在Si（100）基片上的CNx膜是用微波等离子体化学气相沉积法（MWPCVD）制备的。
- The diamond films doped with boron were synthesized on the Si 3N 4 substrate by microwave plasma CVD method (MPCVD). 采用微波等离子体化学气相沉积 ( MPCVD)的方法在 Si3N4 基片上制作了掺硼金刚石薄膜。
- Determination of alkali earth metal by microwave plasma torch atomic emission spectrometry (MPT AES) was investigated. 用微波等离子体炬原子发射光谱法（MPT－AES）测定了一些碱土金属元素。
- Formation of polymeric deposit was investigated in methane conversion by microwave plasma. 摘要考察了微波等离子体甲烷转化反应中积炭的形成条件。
- Combined with inductive coupled plasma source, MS can determine if water is polluted by elements like As or Pb. 结合电感等离子离子源，质谱是水中重金属等元素的检测的标准方法。
- Plasma systems 400 and 660 are low-pressure microwave plasma systems for cleaning advanced chip packages prior to die attach, wire bond and encapsulation. 等离子体400和660系列是低压微波等离子体应用于提高模具粘合，引线的焊接，特别是清洗高级的芯片封装。
- This is accomplished by the use of an inductively coupled plasma source, usually argon. 这可通过电感藕合等离子体光源通常是氩气来实现。
- This paper presents a new method of reduction of sintering low concentration fume absorbed with solid waste by microwave plasma. 提出了一种微波-固体废弃物吸附法降低烧结低浓度有害废气的新方法。
- ZrN thin films were prepared on 45# steel by using ECR-microwave plasma source enhanced deposition. 利用ECR-微波等离子溅射沉积技术不同偏压下在45%23钢基体上制备了ZrN薄膜。
- Watanabe I,Sugata K.Diamond films synthesized by microwave plasma CVD of ethylalcohol[J].Jpn J Appl Phys,1988,27(8):1397. 丁发柱;石玉龙.;直流等离子体-热丝化学气相沉积金刚石薄膜的研究[J]
- The results show that the ECR plasma source may generate stable, high density plasma with low electron temperature. 实验证明，ECR等离子体源能够稳定地产生电子温度较低的高密度等离子体。
- Microwave plasma torch atomic emission spectrometry(MPT-AES) was used to determine the content of calcium and zinc in kelp after being digested. 分别使用常规消解方法与微波消解方法处理海带样品,采用微波等离子体炬原子发射光谱法(MPT-AES)测定海带中钙和锌的含量。
- In this paper, we fulfill this aim by using an ECR plasma source to create the plasma. 本研究利用ECR等离子体源在一个大型真空装置中来实现模拟低地球轨道空间等离子体环境。
