Meanwhile, Salicide-Block process is applied on photo diode area to avoid heavy metal contamination during Salicide formation, then dark current caused by heavy metal defect is suppressed.

 
  • 同时,采用了对像素区域进行SAB遮盖的方法,避免了硅化物工艺带来的重金属污染,从而降低了暗电流。
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