Manganin thin films with low temperature coefficient of resistance were prepared by magnetron sputtering. The changes of TCR under difference deposition and heat treatment conditions were studied.

• 首次采用磁控溅射法沉积了低电阻温度系数的锰铜薄膜，研究了在不同电子科技大学博士学位论文沉积及热处理条件下薄膜TCR的变化。