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- In this study , Poly-crystal ZnO films have been grown by RF magnetron sputtering technique and were investigated the CO gas sensing properties . 中文摘要本论文主要以射频磁控溅镀法,探讨氧化锌薄膜对于有毒气体一氧化碳(CO)的感测特性。
- The coating glass with excellent properties can be prepared by heat evaporate technique or magnetron sputtering technique. 采用热蒸发镀膜与磁控溅射一样也能生产出性能优良的幕墙玻璃。
- ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power,and applied to HIT solar cells. 采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜,并将其应用于HIT太阳电池。
- By RF magnetron sputtering technique,we fabricated La2/3Ca1/3MnO3 films and Ag doping La0.67Ca0.33MnO3?Ag polycrystalline films on Si single crystal(001) substrates. 用射频磁控溅射法在不同温度的Si(001)基片上制备了La0.;67Ca0
- GaAs films have been deposited on substrates of quartz glass and silicon slices by radio frequency magnetron sputtering technique in the atmosphere with or without hydrogen. 作者单位:五邑大学薄膜与纳米材料研究所;华南理工大学物理科学与技术学院;
- The ion gold mixing plating is multi arc ion plating combining with magnetron sputtering technique and is mainly used in gold plating to replace the commonly used but harmful nickel plating. 离子掺金镀是多弧离子镀与磁控溅射有机复合技术,主要用于离子镀金代替目前盛行而危害人体健康的闪镍工艺。
- RF magnetron sputtering technique 射频磁控溅射
- Preparation nanometer Si clusters by RF magnetron sputtering technique RF磁控溅射技术制备纳米硅
- Keywords photoluminescence;electroluminescence;luminescence centers;radio frequency magnetron sputtering technique;heavy atom effect; 射频磁控溅射;光致发光;电致发光;发光中心;重原子效应;
- Man B Y.Guzman L.Miotello A Microstructure,oxidation and H2-permeation resistance of TiAlN films deposited by DC magnetron sputtering technique 2004(1 汪涛.;鲁玉祥
- Magnetron sputtering technique 磁控溅射
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
- Stellite coatings were deposited on stainless steel 2Crl3 by DC magnetron sputtering and then were melted by electron beam. Corrosion resistances in 0.5M H2SQ4 and 0.1M NaCl solution were investigated by means of electrochemical technique. 在不锈钢2Cr13表面;用直流磁控溅射沉积;经电子束熔凝处理;获得司太立合金复层;利用电化学技术研究了在0.;5M硫酸和0
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film. 用磁控溅射低温沉积镀膜技术制做锰铜薄膜 ,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性。
- TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel. 用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。
- A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。