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- Numerical Simulation of Effect of Arc Current and Axial Magnetic Field on Low Current Vacuum Arc Characteristics 电弧电流以及纵向磁场对小电流真空电弧特性影响的数值仿真
- Low current vacuum arc 小电流真空电弧
- For subsonic state (ion) high current vacuum arc, with the increase of electrode separations, the loss of interelectrode plasma increases. 对于离子处于亚音速状态的大电流真空电弧,随着开距的增大,极间等离子体的损失增多。
- PULSED HIGH CURRENT VACUUM ARC COA TING PROCESS 强流脉冲真空电弧镀膜技术
- STUDY ON SHRINKING PHENOMENA IN A HIGH CURRENT VACUUM ARC AND THEORETICAL ANALYSIS OF ANODE SPOT FORMATION 论大电流真空电弧收缩现象和阳极斑点形成的理论分析
- The arc characters of low current in vacuum provides a novel technology to the pre-bonding surface treatment of workpiece in diffusion bonding. 同时利用真空空心阴极小电流条件下的电弧特点,为工件扩散焊前的表面处理提供了一种新的工艺手段;
- Features: Low current, low voltage,low noise. 特点:低电流,低电压,低噪声。
- Low voltage driver and low current consumption. 拥有低电压驱动;低电流消耗的特性.
- Features: Low current, High voltage. 特点:低电流,高电压。
- Direct current metal filtered cathodic vacuum arc(FCVA) and acetylene gas(C_2H_2) are wielded to synthesize amorphous carbon films on Si(100). 采用直流金属磁过滤阴极真空弧(FCVA)制造出Ti和乙炔(C2H2)气体的双等离子体在单晶硅(100)上制备非晶态碳膜.
- Features: Low current, low voltage. 特点:低电流,低电压。
- Finally the principle is studied on how the diameter of shield influences vacuum arc voltage,shield voltage and shield current. 最后研究了屏蔽罩大小对真空灭弧室电弧电压、屏蔽罩电位及屏蔽罩电流的影响。
- Some low current applications require switching through a matrix. 有些小电流应用需要通过矩阵进行切换。
- The effect of second anode action on the cathode vacuum arc discharge stability in the cathode arc deposition technology is studied. 研究了阴极弧等离子体沉积中第二阳极现象改善弧放电稳定性的作用。
- This leakage current will degrade very low current measurements. 这个泄漏电流使得极低电流测量结果恶化。
- Arc slag remelting (ASR) of the ESR absorption and the advantages of vacuum arc remelting. 弧渣重熔(ASR)吸收了电渣重熔和真空电弧重熔的优点。
- Boxman, R. L., Sanders D., Martin P. J., Handbook of Vacuum Arc Science and Technology,(1995). 林建宏,磁控溅射沈积铬基硬质镀膜高温氧化与机械性质研究,中兴大学硕士论文,(1998)。
- The forces applied on the molten pool at the cathode surface under the action of an ex-ternal magnetic field during vacuum arc coating are analyzed. 分析了在外加磁场作用下,真空电弧镀膜中阴极靶面液池的受力情况,导出了液滴喷溅特性受磁场影响的关系式。
- Special techniques are required when switching high current or low current. 在切换大电流或小电流时,都需要专门的技术。
- Amorphous diamond(a-D) films deposited by filtered cathodic vacuum arc(FCVA) technology with different substrate bias were investigated. 采用过滤阴极真空电弧技术,通过施加不同衬底偏压制备了非晶金刚石薄膜。
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