您要查找的是不是:
- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要:本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
- The fabrication technology of single-element-semiconductor quantum dots is introduced in this paper, including RF magnetron sputtering, Si ion implantation, chemical vapor deposition, sol-gel method. 介绍了单元素半导体量子点的制备方法,包括射频磁控溅射技术、硅离子注入技术、化学气相沉积法、溶胶-凝胶法等;
- The results of EPMA showed that the metallicfllms deposited on the metallic substates by the magnetron sputtering ion plating process are the mixed filmswhich consist of the elements of the target and the substrate. 电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。
- The ion gold mixing plating is multi arc ion plating combining with magnetron sputtering technique and is mainly used in gold plating to replace the commonly used but harmful nickel plating. 离子掺金镀是多弧离子镀与磁控溅射有机复合技术,主要用于离子镀金代替目前盛行而危害人体健康的闪镍工艺。
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
- Study on Ion Beam Density of Magnetron Sputtering 磁控溅射离子束流密度的研究
- The PVDF-HFP(poly vinylidenefluoride-hexafluoro propylene) porous membrane for Li ion polymer battery was prepared by a phase inversion process. 采用倒相法制备PVDF-HFP(聚偏氟乙烯-六氟丙烯)多孔薄膜。
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- magnetron sputtering ion plating 磁控溅射离子镀
- TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel. 用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。
- A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。
- Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering. 采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜。
- This system can be used either as multi-arc or magnetron sputtering PVD individually. 也可以单独作为磁控溅射或多弧离子镀膜机使用。
- AlN films with special function and excellent structure can be grown under proper conditions by magnetron sputtering. 采用磁控溅射技术,可以选用在适当的条件下制备具有特定功能与结构优良的氮化铝薄膜。
- Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering. 摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜。
- The power supply will be convenient for controlling the magnetron sputtering coater automatically. 该电源为磁控溅射镀膜设备实现自动控制提供了方便。
- Review on Binders for Li Ion Battery 锂离子电池用胶粘剂