LaNiO3 (LNO) thin films have been prepared on Si(100) substrates by Solution Chemistry Decomposition (SCD) . The effect of pyrolysis temperature, times and thickness of LaNiO3 on preperties of LaNiO3/Si were investigated.

• 采用化学溶液法在 Si(100)衬底上制备 LaNiO3(LNO)导电薄膜,研究不同退火温度、不同薄膜厚度对薄膜性质的影响。