In this letter, we mainly discuss the influences of the flow ratio of precursor gases CH 4 and N 2 on Raman spectra of CN x films and analyze the chemical states of CN x films with X-ray photoelectron spectrum(XPS).

• 本文着重探讨了CH4、N2的流量比对CNx膜的Raman谱的影响，并采用了X－射线光电子能谱（XPS）方法分析了CNx膜的化学状态。