In the test,the arcing which is caused by PVD react chamber has been simulated.The IEMS device has been used to catch this arcing during the deposition.

• 在实际试验中，对由硬件设备而引起的电弧放电现象进行了模拟试验，用IEMS监测系统对反应腔体内的电弧放电现象进行了跟踪。