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- contact glow discharge electrolysis 接触辉光放电
- glow discharge electrolysis plasma 辉光放电电解等离子体
- Treatment of dye wastewater with contact glow discharge electrolysis 接触辉光放电等离子体处理染料废水
- Keywords glow discharge electrolysis;plasma;dye wastewater;Eosin B;degradation; 辉光放电;等离子体;染料废水;伊红B;降解;
- Keywords contact glow discharge electrolysis;plasma;degradation;o-chlorophenol; 接触辉光放电;等离子体;降解;邻氯苯酚;
- Keywords contact glow discharge electrolysis;plasma;RB;FG;dye waste water; 接触辉光放电电解;等离子体;酸性黄;弱酸红;染料废水;
- Degradation of o-chlorophenol in aqueous solution by contact glow discharge electrolysis 接触辉光放电等离子体降解水体中的邻氯苯酚
- Degradation of p-chloronitrobenzene in aqueous solution by contact glow discharge electrolysis 接触辉光放电等离子体降解水体中的对氯硝基苯
- Keywords glow discharge electrolysis plasma;crystal violet;H2O2;dyeing wastewater;degradation; 辉光放电等离子体;结晶紫;H2O2;染料废水;降解;
- Glow discharge electrolysis 辉光放电电解
- The simplest discharge to produce is the glow discharge. 最简单的放电产生方法是辉光放电。
- The analyzed results indicate that it is abnormal glow discharge. 分析表明,放电处于异常辉光区。
- HEAVY PARTICLE TRANSPORT PROCESS IN CATHODE SHEATH OF NITROGEN GLOW DISCHARGE? 氮气辉光放电阴极鞘层重粒子输运过程研究?
- This paper introduces the arc added glow discharge ion titanizing technique. 采用双层辉光离子渗金属技术对纯铜进行了渗钛处理。
- Atmospheric glow discharge in air is produced difficultly due to that the discharge is transited easily to spark discharge. 摘要空气中的大气压辉光放电通常因放电易过渡到火花状态而难以产生。
- Electric discharge characterized by a cathode fall that is small compared with that in a glow discharge. 与辉光放电相比,阴极位降相对较低的放电形式。
- The samples were deposited on c-Si substrates by glow discharge inH_2 and SiCl_4 mixture. 样品是在H_2和SiCl_4混合气体中用辉光放电方法淀积在晶体硅(c-Si)衬底上的.
- DLC and a-SiC:H films were prepared by the rf glow discharge and the reactive sputtering method respectively. 本文分别采用射频(13.;56MHz)等离子体CVD及射频反应溅射方法制得了DLC及a-SiC:H薄膜。
- Pai S T. Analytic approach to glow discharge theory: the physical model [J]. J.Appl.Phys. , 1992, 71(12): 5820. 郭小明;周庭东;白秀庭.;辉光放电等离子体理论模型的建立[J]
- The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced. 介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法。