For sake of probing the possibility of CVD at room temperature by way of laser plasma assisted technique, a new style of CVD device has been designed and manufactured, and was used on practical preparation of Si 3N 4 film from SiH 4 NH 3 N 2 system.

• 为探索用激光和等离子体共同辅助化学气相沉积（CVD）过程以实现室温沉积的可能性，设计并制造了一种新型的CVD装置，实际进行了由SiH4－NH3－N2体系制取Si3N4膜的试验。