For STI CMP process, it controls the HDP SiO2 uniformity in the STI, then impact the well concentration, it will make STI process out of control.

• 因为STI CMP控制着硅沟槽中的HDP SiO2的均匀性，从而影响阱的浓度，使得浅沟道隔离制程控制不好。