Extreme ultraviolet lithography (EUV), as it is known, trains 13-nanometer radiation onto a series of multilayer mirrors that reduce the size of the image projected onto the wafer.

• 众所周知，极紫外光微影技术（EUV）可把13奈米波长的光波投射到一连串的多层膜面镜上，以缩小晶圆上的成像。