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- The cathode vacuum arc ion source and ion implantation facility have been developed in our institute for industrial application of surface modification of materials. 摘要为发展金属离子束材料表面改性技术的工业应用，北师大低能核物理所研制成阴极真空弧离子源和离子注入装置。
- A multi-cathode metal vapor vacuum arc ion source 多阴极金属蒸气真空弧离子源
- Discharge behavior of vacuum arc ion source working in pulse mode 真空弧离子源脉冲工作瞬间的放电行为
- Spatial Beam Distribution of Vacuum Arc Ion Source in Accelerating Area 真空弧离子源引出束流在加速空间的分布
- hot cathode arc ion source 热阴极弧离子源
- low-voltage arc ion source 低压电弧离子源
- KEYWORDS : GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- capillary arc ion source 毛细弧光离子源
- KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating ， medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- Pre-heat suggested when MIG overlay welding for large size products and use pulsed arc welding while overlay the steel. 特别适合镀锌皮的MIG焊接，用于大焊件的MIG堆焊时建议预热，堆焊钢材时建议使用脉冲电弧焊。
- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。
- Furthermore, it controls the dynamic current rise behavior, the maximum current, and the droplet transition during the pulsed arc process. 此外,它在脉冲处理过程中能够控制动态电流提升性能,最大电流和熔滴过渡。
- NiCrAlY coating was deposited on Ti6Al4V substrate by arc ion plating (AIP). 采用电弧离子镀(AIP)技术在Ti6Al4V基体表面沉积制备了NiCrAlY涂层。
- NiCrAlY coatings were deposited on superalloy IC-6 by arc ion plating (AIP). 采用电弧离子镀技术在IC-6高温合金上沉积NiCrAlY涂层.
- pulse arc ion plate 脉冲电弧离子镀
- pulsed bias arc ion plating (PBAIP) 脉冲偏压电弧离子镀（PBAIP）
- The effect of discharge conditions on degradation of P-nitrophenol in organicpollution water with pulsed arc discharge plasma at atmospheric pressure was investigated in this paper. 摘要利用大气压下脉冲电弧等离子体对含对硝基苯酚的有机废水进行处理，研究放电条件对废水处理效果的影响。
- Pulsed vacuum arc ion deposition 脉冲真空电弧离子镀
- pulsed electron impact ion source 脉冲电子碰撞离子源
- Cathodic arc ion plating (CAIP) has been widely applied in modern technology field. 多弧离子镀在现代科技领域中有着广泛的应用。
