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- ECR溅射镀膜ECR sputtering
- X模耦合微波的ECR溅射装置的放电特性Discharge Characteristics of ECR Sputtering Apparatus Used X Mode Coupling Microwave
- 真空波导磁场控制型ECR溅射法的实验研究Study of Magnetic Field Control Type ECR Sputtering Method Used Vaccum Waveguide
- 离子溅射镀膜台ion sputtering coater
- 直流磁控溅射镀膜DC magnetron sputtering
- 直流磁控溅射镀膜在玻璃涂层技术中的应用Application of DC Magnetron Sputtering Coating in the Glass Coating Technique
- 磁控溅射镀膜中工作气压对沉积速率的影响Influence of the working gas pressure on the deposition rate in magnetron sputtering for thin coating
- 微波ECR等离子体源增强非平衡磁控溅射DLC膜的制备与表征Preparation and characterization of DLC films by microwave ECR plasma source enhanced unbalance magnetron sputtering
- 溅射镀膜sputter coating
- 溅射镀膜磁带[化] sputtering tape
- 溅射态as-deposited
- 阴极溅射镀膜法cathode sputtering process
- 溅射角Deposition surface inclination angle
- 交替溅射alternating sputtering
- 真空溅射镀膜玻璃vacuum sputtering coated glass
- 溅射功率sputtering power
- 溅射气压sputtering pressure
- 间歇溅射fitful-sputtering
- 真空溅射镀膜机继电器-接触器控制系统的设计与研究Design And Research of the Relay-contact Control System in The Vacuum Sputtering Coater
- 溅射时间sputtering time
