Distribution and precipitation of Ni in Si were studied by atomic absorption spectrometry (AAS), X-Ray fluorescence analysis (XRF) and scaning electron microscope (SEM) . The concentration of Ni is much higher at Si surface than in the interior.

• 用原子吸收光谱和X射线荧光光谱,测得Ni在Si中的分布为内部浓度低,表面浓度高的U形分布。