Compared with the results based on Hopkins theory, the fast computer simulation results show that the diffraction intensity in proximity lithography may be simulated more rapidly and precisely with the new model.

• 结果表明采用基尔霍夫衍射理论及多点光源的衍射光场非相干叠加的模型不仅快速而且也可以比较准确地模拟接近式光刻的衍射光场分布。