Although the AlN layer was not fully relaxed as confirmed by the RHEED in-situ d-spacing measurement, it largely decreased the mismatch between the ZnO and the sapphire substrate.

 
  • 由于氮气气氛下射频处理后,会在衬底表面形成一个薄的AlN层,很大程度上减小氧化锌和衬底之间的晶格失配率,从而改善了氧化锌的结晶质量。
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