为此，我们实施了对于刻蚀均匀的比较厚的已知锗浓度的锗硅薄膜的同步椭偏测量。

为此，我们实施了对于刻蚀均匀的比较厚的已知锗浓度的锗硅薄膜的同步椭偏测量。的英文翻译

基本释义

• To this end, we have performed in situ ellipsometry measurements while etching through homogeneous, comparatively thick SiGe films of a known Ge content.